Trace impurities in high-purity O, H, or N were determined by removal of main component gas with base gas absorber followed by gas chromatog. with photoionization detection.O was removed by Cu catalyst at 140°, H was removed by LaNi5 at 25°, and N was removed by Ti alloy at 250° followed by LaNi5 at 25°.The calibration graph was linear for <5 ppm Ne, N, Ar, Kr, Xe, and CH4 in O.The determination limits of Ne, N, Ar, Kr, Xe, and CH4 were 3.8, 0.04, 0.03, 0.01, 0.01, and 0.02 ppm, resp., for O; 5.0, 0.06, 0.05, 0.02, 0.02, and 0.04 ppm, resp. for H; and 3.7, -, 0.08, 0.03, 0.09, and 0.04 ppm, resp. for N.CO, CO2, N2O, NO, and NO2 were not determined by the method.